ultraviolet proximity lithography

ultravioletinė prošvaisinė litografija statusas T sritis radioelektronika atitikmenys: angl. ultraviolet proximity lithography; ultraviolet proximity printing vok. Abstandsbelichtungslithografie mit Ultraviolettstrahlen, f rus. ультрафиолетовая литография с микрозазором, f pranc. lithographie à micro-écart et exposition ultraviolette, f

Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. . 2000.

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  • ultraviolet proximity printing — ultravioletinė prošvaisinė litografija statusas T sritis radioelektronika atitikmenys: angl. ultraviolet proximity lithography; ultraviolet proximity printing vok. Abstandsbelichtungslithografie mit Ultraviolettstrahlen, f rus. ультрафиолетовая… …   Radioelektronikos terminų žodynas

  • Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as …   Wikipedia

  • Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia

  • Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …   Wikipedia

  • Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

  • Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …   Wikipedia

  • X-ray lithography — is a next generation lithography that has been developed for the semiconductor industryref|vlad. Batches of microprocessors have already been produced. The short wavelengths of 0.8 nm X rays overcome diffraction limits in the resolution of… …   Wikipedia

  • Abstandsbelichtungslithografie mit Ultraviolettstrahlen — ultravioletinė prošvaisinė litografija statusas T sritis radioelektronika atitikmenys: angl. ultraviolet proximity lithography; ultraviolet proximity printing vok. Abstandsbelichtungslithografie mit Ultraviolettstrahlen, f rus. ультрафиолетовая… …   Radioelektronikos terminų žodynas

  • lithographie à micro-écart et exposition ultraviolette — ultravioletinė prošvaisinė litografija statusas T sritis radioelektronika atitikmenys: angl. ultraviolet proximity lithography; ultraviolet proximity printing vok. Abstandsbelichtungslithografie mit Ultraviolettstrahlen, f rus. ультрафиолетовая… …   Radioelektronikos terminų žodynas

  • ultravioletinė prošvaisinė litografija — statusas T sritis radioelektronika atitikmenys: angl. ultraviolet proximity lithography; ultraviolet proximity printing vok. Abstandsbelichtungslithografie mit Ultraviolettstrahlen, f rus. ультрафиолетовая литография с микрозазором, f pranc.… …   Radioelektronikos terminų žodynas

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